Plasma system

Plasma system

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Plasma Treatment System >
VPTS Series Vacuum
Plasma Treatment System
The vacuum plasma treatment system is designed for surface purification, activation, roughening, etching, and grafting. It can be used to treat various materials, including polymers, metals, and semiconductors.

Product Advantages

Human-machine interactive system
Suitable for complex 3D workpieces
Does not alter the inherent properties of the material; modification occurs only on the surface
Fully dry processing with no pollution
Low-temperature treatment, suitable for heat-sensitive materials
High stability and long service life
Low energy consumption and minimal maintenance costs

Product Parameters

Supply and demand

Power supply:380V/50Hz, three-phase, 15A
Process gas: Input pressure 0.2MPA
Compressed air: Input pressure 0.6MPA

Optional configuration

• RF generator
• Circulating water cooler
• Vacuum chamber size (customizable)
• MFC resistant to corrosive gases
• Vacuum pump


Product model/configuration VPTS-80 VPTS-110
dimension 1050x1020x1750mm 1050x1020x1750mm
Vacuum chamber size 450x400x450 mm 530x520x400 mm
Effective size of bracket 400x320mm,6floor 480×330mm,8floor
Vacuum chamber material Al-mg alloy
Vacuum pump Dual oil pump
Mass flow controller 0-500 Sccm(Optional)
Vacuum gauge ULVAC
Radio frequency power supply 13.56MHZ(Power optional)
Water cooling system Water cooled electrode plate + Water cooler (optional)
PLC System brand Siemens
Electrical system brand Schneider
Touch screen 10.7
Treatment gas O2 、Ar 、N2 、 CDA

Industry Applications

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